Show simple item record

Phase Shifting Masks for Optical Lithography: Principles, Manufacturing, and Imaging Performance

dc.contributor.authorRonse, Kurt
dc.date.accessioned2021-09-29T12:46:17Z
dc.date.available2021-09-29T12:46:17Z
dc.date.issued1994-09
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/319
dc.sourceIIOimport
dc.titlePhase Shifting Masks for Optical Lithography: Principles, Manufacturing, and Imaging Performance
dc.typePHD thesis
dc.contributor.imecauthorRonse, Kurt
dc.source.peerreviewno
dc.contributor.thesisadvisorDeclerck, Gilbert
imec.availabilityPublished - imec


Files in this item

FilesSizeFormatView

There are no files associated with this item.

This item appears in the following collection(s)

Show simple item record