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Observation of critical gate oxide thickness for substrate-defect related oxide failure

dc.contributor.authorBearda, Twan
dc.contributor.authorHoussa, Michel
dc.contributor.authorMertens, Paul
dc.contributor.authorVanhellemont, Jan
dc.contributor.authorHeyns, Marc
dc.date.accessioned2021-10-06T10:41:52Z
dc.date.available2021-10-06T10:41:52Z
dc.date.issued1999
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/3215
dc.sourceIIOimport
dc.titleObservation of critical gate oxide thickness for substrate-defect related oxide failure
dc.typeJournal article
dc.contributor.imecauthorHoussa, Michel
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecHoussa, Michel::0000-0003-1844-3515
dc.source.peerreviewno
dc.source.beginpage1255
dc.source.endpage1257
dc.source.journalAppl. Phys. Lett.
dc.source.issue9
dc.source.volume75
imec.availabilityPublished - imec


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