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dc.contributor.authorVos, Rita
dc.contributor.authorRolin, Cedric
dc.contributor.authorRip, Jens
dc.contributor.authorConard, Thierry
dc.contributor.authorSteylaerts, Tim
dc.contributor.authorVidal Cabanilles, Maria
dc.contributor.authorLevrie, Karen
dc.contributor.authorJans, Karolien
dc.contributor.authorStakenborg, Tim
dc.date.accessioned2021-10-26T08:54:02Z
dc.date.available2021-10-26T08:54:02Z
dc.date.issued2018
dc.identifier.issn0743-7463
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/32225
dc.sourceIIOimport
dc.titleChemical vapor deposition of azidoalkylsilane monolayer films
dc.typeJournal article
dc.contributor.imecauthorVos, Rita
dc.contributor.imecauthorRolin, Cedric
dc.contributor.imecauthorRip, Jens
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorSteylaerts, Tim
dc.contributor.imecauthorVidal Cabanilles, Maria
dc.contributor.imecauthorJans, Karolien
dc.contributor.imecauthorStakenborg, Tim
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecStakenborg, Tim::0000-0001-9878-9078
dc.source.peerreviewyes
dc.source.beginpage1400
dc.source.endpage1409
dc.source.journalLangmuir
dc.source.issue4
dc.source.volume34
dc.identifier.urlhttps://pubs.acs.org/doi/abs/10.1021/acs.langmuir.7b04011
imec.availabilityPublished - imec


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