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On the extraction of resistivity and area of nanoscale interconnect lines by temperature-dependent resistance measurements

dc.contributor.authorAdelmann, Christoph
dc.date.accessioned2021-10-27T07:25:06Z
dc.date.available2021-10-27T07:25:06Z
dc.date.issued2019
dc.identifier.issn0038-1101
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/32404
dc.sourceIIOimport
dc.titleOn the extraction of resistivity and area of nanoscale interconnect lines by temperature-dependent resistance measurements
dc.typeJournal article
dc.contributor.imecauthorAdelmann, Christoph
dc.contributor.orcidimecAdelmann, Christoph::0000-0002-4831-3159
dc.source.peerreviewyes
dc.source.beginpage72
dc.source.endpage80
dc.source.journalSolid-State Electronics
dc.source.volume152
dc.identifier.urlhttps://doi.org/10.1016/j.sse.2018.12.005
imec.availabilityPublished - imec


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