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Low-k integration: Gas screening for cryogenic etching and damage mitigation

dc.contributor.authorChanson, Romain
dc.contributor.authorDussart, Remi
dc.contributor.authorTillocher, Thomas
dc.contributor.authorLefaucheux, Philippe
dc.contributor.authorDussarrat, Christian
dc.contributor.authorde Marneffe, Jean-Francois
dc.date.accessioned2021-10-27T07:58:11Z
dc.date.available2021-10-27T07:58:11Z
dc.date.issued2019
dc.identifier.issn2095-0187
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/32687
dc.sourceIIOimport
dc.titleLow-k integration: Gas screening for cryogenic etching and damage mitigation
dc.typeJournal article
dc.contributor.imecauthorde Marneffe, Jean-Francois
dc.source.peerreviewyes
dc.source.beginpage511
dc.source.endpage516
dc.source.journalFrontiers of Chemical Science and Engineering
dc.source.issue3
dc.source.volume13
dc.identifier.urlhttps://doi.org/10.1007/s11705-019-1820-5
imec.availabilityPublished - imec


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