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RC benefits of advanced metallization options

dc.contributor.authorCiofi, Ivan
dc.contributor.authorRoussel, Philippe
dc.contributor.authorBaert, Rogier
dc.contributor.authorContino, Antonino
dc.contributor.authorGupta, Anshul
dc.contributor.authorCroes, Kristof
dc.contributor.authorWilson, Chris
dc.contributor.authorMocuta, Dan
dc.contributor.authorTokei, Zsolt
dc.date.accessioned2021-10-27T08:04:02Z
dc.date.available2021-10-27T08:04:02Z
dc.date.issued2019
dc.identifier.issn0018-9383
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/32714
dc.sourceIIOimport
dc.titleRC benefits of advanced metallization options
dc.typeJournal article
dc.contributor.imecauthorCiofi, Ivan
dc.contributor.imecauthorRoussel, Philippe
dc.contributor.imecauthorBaert, Rogier
dc.contributor.imecauthorContino, Antonino
dc.contributor.imecauthorGupta, Anshul
dc.contributor.imecauthorCroes, Kristof
dc.contributor.imecauthorWilson, Chris
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.orcidimecCiofi, Ivan::0000-0003-1374-4116
dc.contributor.orcidimecRoussel, Philippe::0000-0002-0402-8225
dc.contributor.orcidimecCroes, Kristof::0000-0002-3955-0638
dc.source.peerreviewyes
dc.source.beginpage2339
dc.source.endpage2345
dc.source.journalIEEE Transactions on Electron Devices
dc.source.issue5
dc.source.volume66
dc.identifier.urlhttps://ieeexplore.ieee.org/document/8680758
imec.availabilityPublished - imec


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