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Opportunities and challenges in APT metrology for semiconductor applications

dc.contributor.authorFleischmann, Claudia
dc.contributor.authorCuduvally, Ramya
dc.contributor.authorMorris, Richard
dc.contributor.authorMelkonyan, Davit
dc.contributor.authorOp de Beeck, Jonathan
dc.contributor.authorMakhotkin, Igor
dc.contributor.authorvan der Heide, Paul
dc.contributor.authorVandervorst, Wilfried
dc.date.accessioned2021-10-27T09:15:30Z
dc.date.available2021-10-27T09:15:30Z
dc.date.issued2019
dc.identifier.issn1431-9276
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/32969
dc.sourceIIOimport
dc.titleOpportunities and challenges in APT metrology for semiconductor applications
dc.typeJournal article
dc.contributor.imecauthorFleischmann, Claudia
dc.contributor.imecauthorCuduvally, Ramya
dc.contributor.imecauthorMorris, Richard
dc.contributor.imecauthorOp de Beeck, Jonathan
dc.contributor.imecauthorMakhotkin, Igor
dc.contributor.imecauthorvan der Heide, Paul
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.orcidimecFleischmann, Claudia::0000-0003-1531-6916
dc.contributor.orcidimecMorris, Richard::0000-0002-0902-7088
dc.contributor.orcidimecOp de Beeck, Jonathan::0000-0003-3471-2156
dc.contributor.orcidimecvan der Heide, Paul::0000-0001-6292-0329
dc.source.peerreviewyes
dc.source.beginpage312
dc.source.journalMicroscopy and Microanalysis
dc.source.issueSuppl. 2
dc.source.volume25
dc.identifier.urlhttps://doi.org/10.1017/S1431927619002290
imec.availabilityPublished - imec
imec.internalnotesAbstract Microscopy&Microanalysis, August 2019, Portland, OR, USA


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