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Electrical characterization of BEOL plasma-induced damage in bulk FinFET technology

dc.contributor.authorHiblot, Gaspard
dc.contributor.authorSubirats, Alexandre
dc.contributor.authorLiu, Yefan
dc.contributor.authorVan der Plas, Geert
dc.date.accessioned2021-10-27T10:27:50Z
dc.date.available2021-10-27T10:27:50Z
dc.date.issued2019
dc.identifier.issn1530-4388
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/33158
dc.sourceIIOimport
dc.titleElectrical characterization of BEOL plasma-induced damage in bulk FinFET technology
dc.typeJournal article
dc.contributor.imecauthorHiblot, Gaspard
dc.contributor.imecauthorLiu, Yefan
dc.contributor.imecauthorVan der Plas, Geert
dc.contributor.orcidimecHiblot, Gaspard::0000-0002-3869-965X
dc.contributor.orcidimecVan der Plas, Geert::0000-0002-4975-6672
dc.source.peerreviewyes
dc.source.beginpage88
dc.source.endpage89
dc.source.journalIEEE Transactions on Device and Materials Reliability
dc.source.issue1
dc.source.volume19
dc.identifier.urlhttps://ieeexplore.ieee.org/document/8537789
imec.availabilityPublished - imec


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