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Electron beam metrology for advanced technology nodes

dc.contributor.authorLorusso, Gian
dc.contributor.authorHoriguchi, Naoto
dc.contributor.authorBoemmels, Juergen
dc.contributor.authorWilson, Chris
dc.contributor.authorVan den Bosch, Geert
dc.contributor.authorKar, Gouri Sankar
dc.contributor.authorOhashi, Takeyoshi
dc.contributor.authorSutani, Takumichi
dc.contributor.authorWatanabe, Ryota
dc.contributor.authorTakemasa, Yoshikata
dc.contributor.authorIkota, Masami
dc.date.accessioned2021-10-27T12:58:56Z
dc.date.available2021-10-27T12:58:56Z
dc.date.issued2019
dc.identifier.issn0021-4922
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/33477
dc.sourceIIOimport
dc.titleElectron beam metrology for advanced technology nodes
dc.typeJournal article
dc.contributor.imecauthorLorusso, Gian
dc.contributor.imecauthorHoriguchi, Naoto
dc.contributor.imecauthorBoemmels, Juergen
dc.contributor.imecauthorWilson, Chris
dc.contributor.imecauthorVan den Bosch, Geert
dc.contributor.imecauthorKar, Gouri Sankar
dc.contributor.orcidimecHoriguchi, Naoto::0000-0001-5490-0416
dc.contributor.orcidimecVan den Bosch, Geert::0000-0001-9971-6954
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpageSD0801
dc.source.journalJapanese Journal of Applied Physics
dc.source.issueSD
dc.source.volume58
dc.identifier.urlhttps://doi.org/10.7567/1347-4065/ab1475
imec.availabilityPublished - open access


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