dc.contributor.author | Ludwig, Jonathan | |
dc.contributor.author | Mascaro, Marco | |
dc.contributor.author | Celano, Umberto | |
dc.contributor.author | Vandervorst, Wilfried | |
dc.contributor.author | Paredis, Kristof | |
dc.date.accessioned | 2021-10-27T13:01:36Z | |
dc.date.available | 2021-10-27T13:01:36Z | |
dc.date.issued | 2019 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/33482 | |
dc.source | IIOimport | |
dc.title | Advantages of high vacuum for electrical scanning probe microscopy | |
dc.type | Journal article | |
dc.contributor.imecauthor | Ludwig, Jonathan | |
dc.contributor.imecauthor | Mascaro, Marco | |
dc.contributor.imecauthor | Celano, Umberto | |
dc.contributor.imecauthor | Vandervorst, Wilfried | |
dc.contributor.imecauthor | Paredis, Kristof | |
dc.contributor.orcidimec | Celano, Umberto::0000-0002-2856-3847 | |
dc.contributor.orcidimec | Paredis, Kristof::0000-0002-5163-4164 | |
dc.source.peerreview | no | |
dc.source.beginpage | June 6th | |
dc.source.journal | Compound Semiconductor | |
dc.identifier.url | https://compoundsemiconductor.net/article/107568/Advantages_of_High_Vacuum_for_Electrical_Scanning_Probe_Microscopy | |
imec.availability | Published - imec | |
imec.internalnotes | News article on website | |