dc.contributor.author | Ohashi, Takeyoshi | |
dc.contributor.author | Hasumi, Kazuhisa | |
dc.contributor.author | Ikota, Masami | |
dc.contributor.author | Lorusso, Gian | |
dc.contributor.author | Mertens, Hans | |
dc.contributor.author | Horiguchi, Naoto | |
dc.date.accessioned | 2021-10-27T14:59:21Z | |
dc.date.available | 2021-10-27T14:59:21Z | |
dc.date.issued | 2019 | |
dc.identifier.issn | 1932-5150 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/33690 | |
dc.source | IIOimport | |
dc.title | Contact inspection and resistance - capacitance measurement of Si nanowire with SEM voltage contrast | |
dc.type | Journal article | |
dc.contributor.imecauthor | Lorusso, Gian | |
dc.contributor.imecauthor | Mertens, Hans | |
dc.contributor.imecauthor | Horiguchi, Naoto | |
dc.contributor.orcidimec | Horiguchi, Naoto::0000-0001-5490-0416 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 21205 | |
dc.source.journal | Journal of Micro/Nanolithography MEMS and MOEMS | |
dc.source.issue | 2 | |
dc.source.volume | 18 | |
dc.identifier.url | https://doi.org/10.1117/1.JMM.18.2.021205 | |
imec.availability | Published - imec | |