Show simple item record

Controlled cobalt recess for advanced interconnect metallization

dc.contributor.authorPacco, Antoine
dc.contributor.authorAkanishi, Yuya
dc.contributor.authorLe, Quoc Toan
dc.contributor.authorKesters, Els
dc.contributor.authorMurdoch, Gayle
dc.contributor.authorHolsteyns, Frank
dc.date.accessioned2021-10-27T15:15:22Z
dc.date.available2021-10-27T15:15:22Z
dc.date.issued2019
dc.identifier.issn0167-9317
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/33717
dc.sourceIIOimport
dc.titleControlled cobalt recess for advanced interconnect metallization
dc.typeJournal article
dc.contributor.imecauthorPacco, Antoine
dc.contributor.imecauthorAkanishi, Yuya
dc.contributor.imecauthorLe, Quoc Toan
dc.contributor.imecauthorKesters, Els
dc.contributor.imecauthorMurdoch, Gayle
dc.contributor.imecauthorHolsteyns, Frank
dc.contributor.orcidimecLe, Quoc Toan::0000-0002-0206-6279
dc.source.peerreviewyes
dc.source.beginpage111131
dc.source.journalMicroelectronic Engineering
dc.source.volume217
dc.identifier.urlhttps://doi.org/10.1016/j.mee.2019.111131
imec.availabilityPublished - imec


Files in this item

FilesSizeFormatView

There are no files associated with this item.

This item appears in the following collection(s)

Show simple item record