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Wet-chemical etching of metals for advanced semiconductor technology nodes: Ru etching in acidic Ce4+ solutions

dc.contributor.authorPhilipsen, Harold
dc.contributor.authorMouwen, Nils
dc.contributor.authorTeck, Sander
dc.contributor.authorMonnens, Wouter
dc.contributor.authorLe, Quoc Toan
dc.contributor.authorHolsteyns, Frank
dc.contributor.authorStruyf, Herbert
dc.date.accessioned2021-10-27T16:00:26Z
dc.date.available2021-10-27T16:00:26Z
dc.date.issued2019
dc.identifier.issn0013-4686
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/33792
dc.sourceIIOimport
dc.titleWet-chemical etching of metals for advanced semiconductor technology nodes: Ru etching in acidic Ce4+ solutions
dc.typeJournal article
dc.contributor.imecauthorPhilipsen, Harold
dc.contributor.imecauthorLe, Quoc Toan
dc.contributor.imecauthorHolsteyns, Frank
dc.contributor.imecauthorStruyf, Herbert
dc.contributor.orcidimecPhilipsen, Harold::0000-0002-5029-1104
dc.contributor.orcidimecLe, Quoc Toan::0000-0002-0206-6279
dc.source.peerreviewyes
dc.source.beginpage285
dc.source.endpage298
dc.source.journalElectrochimica Acta
dc.source.volume306
dc.identifier.urlhttps://doi.org/10.1016/j.electacta.2019.03.065
imec.availabilityPublished - imec


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