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Atomic layer deposition of vanadium oxides: process and application review

dc.contributor.authorPrasadam, Vasu Prasad
dc.contributor.authorBahlawane, Naoufal
dc.contributor.authorMattelaer, Felix
dc.contributor.authorRampelberg, Geert
dc.contributor.authorDetavernier, Christophe
dc.contributor.authorFang, Libin
dc.contributor.authorJiang, Yinzhu
dc.contributor.authorMartens, Koen
dc.contributor.authorParkin, Ivan
dc.contributor.authorPapakonstantinou, Ioannis
dc.date.accessioned2021-10-27T16:20:48Z
dc.date.available2021-10-27T16:20:48Z
dc.date.issued2019
dc.identifier.issn2468-5194
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/33823
dc.sourceIIOimport
dc.titleAtomic layer deposition of vanadium oxides: process and application review
dc.typeJournal article
dc.contributor.imecauthorMartens, Koen
dc.contributor.orcidimecMartens, Koen::0000-0001-7135-5536
dc.source.peerreviewyes
dc.source.beginpage396
dc.source.endpage423
dc.source.journalMaterials Today Chemistry
dc.source.volume12
dc.identifier.urlhttps://doi.org/10.1016/j.mtchem.2019.03.004
imec.availabilityPublished - imec


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