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Self-focusing SIMS: A metrology solution to area selective deposition

dc.contributor.authorSpampinato, Valentina
dc.contributor.authorArmini, Silvia
dc.contributor.authorFranquet, Alexis
dc.contributor.authorConard, Thierry
dc.contributor.authorvan der Heide, Paul
dc.contributor.authorVandervorst, Wilfried
dc.date.accessioned2021-10-27T18:52:20Z
dc.date.available2021-10-27T18:52:20Z
dc.date.issued2019
dc.identifier.issn0169-4332
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/34053
dc.sourceIIOimport
dc.titleSelf-focusing SIMS: A metrology solution to area selective deposition
dc.typeJournal article
dc.contributor.imecauthorSpampinato, Valentina
dc.contributor.imecauthorArmini, Silvia
dc.contributor.imecauthorFranquet, Alexis
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorvan der Heide, Paul
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.orcidimecSpampinato, Valentina::0000-0003-3225-6740
dc.contributor.orcidimecArmini, Silvia::0000-0003-0578-3422
dc.contributor.orcidimecFranquet, Alexis::0000-0002-7371-8852
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecvan der Heide, Paul::0000-0001-6292-0329
dc.source.peerreviewyes
dc.source.beginpage594
dc.source.endpage599
dc.source.journalApplied Surface Science
dc.source.volume476
dc.identifier.urlhttps://doi.org/10.1016/j.apsusc.2019.01.107
imec.availabilityPublished - imec


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