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Novel aberration monitor for optical lithography

dc.contributor.authorDirksen, Peter
dc.contributor.authorJuffermans, Casper
dc.contributor.authorPellens, R. J.
dc.contributor.authorMaenhoudt, Mireille
dc.contributor.authorDe Bisschop, Peter
dc.date.accessioned2021-10-06T11:05:18Z
dc.date.available2021-10-06T11:05:18Z
dc.date.issued1999
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/3424
dc.sourceIIOimport
dc.titleNovel aberration monitor for optical lithography
dc.typeProceedings paper
dc.contributor.imecauthorDe Bisschop, Peter
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage77
dc.source.endpage86
dc.source.conferenceOptical Microlithography XII
dc.source.conferencedate14/03/1999
dc.source.conferencelocationSanta Clara, CA USa
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 3679


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