dc.contributor.author | Vereecken, Philippe | |
dc.contributor.author | Radisic, Alex | |
dc.contributor.author | Ross, Frances | |
dc.date.accessioned | 2021-10-27T22:27:13Z | |
dc.date.available | 2021-10-27T22:27:13Z | |
dc.date.issued | 2019 | |
dc.identifier.issn | 0013-4651 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/34357 | |
dc.source | IIOimport | |
dc.title | Differential inhibition during Cu electrodeposition on Ru: combined electrochemical and real-time TEM studies | |
dc.type | Journal article | |
dc.contributor.imecauthor | Vereecken, Philippe | |
dc.contributor.imecauthor | Radisic, Alex | |
dc.contributor.orcidimec | Vereecken, Philippe::0000-0003-4115-0075 | |
dc.source.peerreview | yes | |
dc.source.beginpage | D3129 | |
dc.source.endpage | D3135 | |
dc.source.journal | Journal of the Electrochemical Society | |
dc.source.issue | 1 | |
dc.source.volume | 166 | |
dc.identifier.url | http://jes.ecsdl.org/content/166/1/D3129.abstract | |
imec.availability | Published - imec | |