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Role of metal sensitizers for sensitivity improvement in EUV chemically amplified resist

dc.contributor.authorYamamoto, Hiroki
dc.contributor.authorVesters, Yannick
dc.contributor.authorJiang, Jing
dc.contributor.authorDe Simone, Danilo
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorKozawa, Takahiro
dc.date.accessioned2021-10-27T23:57:09Z
dc.date.available2021-10-27T23:57:09Z
dc.date.issued2019-01
dc.identifier.issn0914-9244
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/34477
dc.sourceIIOimport
dc.titleRole of metal sensitizers for sensitivity improvement in EUV chemically amplified resist
dc.typeJournal article
dc.contributor.imecauthorDe Simone, Danilo
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.orcidimecDe Simone, Danilo::0000-0003-3927-5207
dc.source.peerreviewyes
dc.source.beginpage747
dc.source.endpage751
dc.source.journalJournal of Photopolymer Science and Technology
dc.source.issue6
dc.source.volume31
dc.identifier.urlhttps://doi.org/10.2494/photopolymer.31.747
imec.availabilityPublished - imec


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