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Motion artifact reduction for wrist-worn photoplethysmograph sensors based on different wavelengths

dc.contributor.authorZhang, Yifan
dc.contributor.authorSong, Shuang
dc.contributor.authorVullings, Rik
dc.contributor.authorBiswas, Dwaipayan
dc.contributor.authorSimoes Capela, Neide
dc.contributor.authorVan Helleputte, Nick
dc.contributor.authorVan Hoof, Chris
dc.contributor.authorGroenendaal, Willemijn
dc.date.accessioned2021-10-28T00:47:36Z
dc.date.available2021-10-28T00:47:36Z
dc.date.issued2019
dc.identifier.issn1424-8220
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/34542
dc.sourceIIOimport
dc.titleMotion artifact reduction for wrist-worn photoplethysmograph sensors based on different wavelengths
dc.typeJournal article
dc.contributor.imecauthorSong, Shuang
dc.contributor.imecauthorBiswas, Dwaipayan
dc.contributor.imecauthorSimoes Capela, Neide
dc.contributor.imecauthorVan Helleputte, Nick
dc.contributor.imecauthorVan Hoof, Chris
dc.contributor.imecauthorGroenendaal, Willemijn
dc.contributor.orcidimecVan Helleputte, Nick::0000-0002-7511-1923
dc.contributor.orcidimecVan Hoof, Chris::1234-1234-1234-1234
dc.contributor.orcidimecGroenendaal, Willemijn::0000-0003-1024-0756
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage673
dc.source.journalSensors
dc.source.issue3
dc.source.volume19
dc.identifier.urlhttps://www.mdpi.com/1424-8220/19/3/673
imec.availabilityPublished - open access


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