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Wet chemical processing of Ge in acidic H2O2 solution: nanoscale etching and surface chemistry

dc.contributor.authorAbrenica, Graniel
dc.contributor.authorFingerle, Mathias
dc.contributor.authorLebedev, Mikhail
dc.contributor.authorArnauts, Sophia
dc.contributor.authorMayer, Thomas
dc.contributor.authorHolsteyns, Frank
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorvan Dorp, Dennis
dc.date.accessioned2021-10-28T20:08:58Z
dc.date.available2021-10-28T20:08:58Z
dc.date.issued2020
dc.identifier.issn2162-8769
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/34586
dc.sourceIIOimport
dc.titleWet chemical processing of Ge in acidic H2O2 solution: nanoscale etching and surface chemistry
dc.typeJournal article
dc.contributor.imecauthorAbrenica, Graniel
dc.contributor.imecauthorArnauts, Sophia
dc.contributor.imecauthorHolsteyns, Frank
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorvan Dorp, Dennis
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.contributor.orcidimecvan Dorp, Dennis::0000-0002-1085-4232
dc.source.peerreviewyes
dc.source.beginpage84002
dc.source.journalECS Journal of Solid State Science and Technology
dc.source.issue8
dc.source.volume9
dc.identifier.urlhttps://doi.org/10.1149/2162-8777/abb1c5
imec.availabilityPublished - imec


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