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Advanced photoresists for 193 nm lithography

dc.contributor.authorGoethals, Mieke
dc.contributor.authorRonse, Kurt
dc.date.accessioned2021-10-06T11:12:56Z
dc.date.available2021-10-06T11:12:56Z
dc.date.issued1999
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/3468
dc.sourceIIOimport
dc.titleAdvanced photoresists for 193 nm lithography
dc.typeJournal article
dc.contributor.imecauthorRonse, Kurt
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage143
dc.source.endpage151
dc.source.journalFuture Fab International
dc.source.issue7
imec.availabilityPublished - open access


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