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A study of the planarization process during chemical mechanical polishing for oxides and shallow trench isolation

dc.contributor.authorGrillaert, Joost
dc.date.accessioned2021-10-06T11:13:26Z
dc.date.available2021-10-06T11:13:26Z
dc.date.issued1999-05
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/3471
dc.sourceIIOimport
dc.titleA study of the planarization process during chemical mechanical polishing for oxides and shallow trench isolation
dc.typePHD thesis
dc.source.peerreviewno
imec.availabilityPublished - imec
imec.internalnotesThesis Advisor: Prof. Dr. Ir. G. Declerck


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