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Reliability the limit to gate oxide shrink?

dc.contributor.authorGroeseneken, Guido
dc.contributor.authorDegraeve, Robin
dc.contributor.authorWauters, Jan
dc.date.accessioned2021-10-06T11:14:41Z
dc.date.available2021-10-06T11:14:41Z
dc.date.issued1999
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/3478
dc.sourceIIOimport
dc.titleReliability the limit to gate oxide shrink?
dc.typeJournal article
dc.contributor.imecauthorGroeseneken, Guido
dc.contributor.imecauthorDegraeve, Robin
dc.source.peerreviewno
dc.source.beginpage23,25
dc.source.journalEuropean Semiconductor
dc.source.issue7
dc.source.volume21
imec.availabilityPublished - imec


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