Show simple item record

Low-frequency noise assessment on vertically stacked Si n-channel nanosheet FETs with different metal gates

dc.contributor.authorde Oliveira, Alberto
dc.contributor.authorVeloso, Anabela
dc.contributor.authorClaeys, Cor
dc.contributor.authorHoriguchi, Naoto
dc.contributor.authorSimoen, Eddy
dc.date.accessioned2021-10-28T21:03:29Z
dc.date.available2021-10-28T21:03:29Z
dc.date.issued2020
dc.identifier.issn0018-9383
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/34987
dc.sourceIIOimport
dc.titleLow-frequency noise assessment on vertically stacked Si n-channel nanosheet FETs with different metal gates
dc.typeJournal article
dc.contributor.imecauthorVeloso, Anabela
dc.contributor.imecauthorHoriguchi, Naoto
dc.contributor.imecauthorSimoen, Eddy
dc.contributor.orcidimecHoriguchi, Naoto::0000-0001-5490-0416
dc.contributor.orcidimecSimoen, Eddy::0000-0002-5218-4046
dc.source.peerreviewyes
dc.source.beginpage4802
dc.source.endpage4807
dc.source.journalIEEE Transactions on Electron Devices
dc.source.issue11
dc.source.volume67
dc.identifier.urlhttps://ieeexplore.ieee.org/document/9205835
imec.availabilityPublished - imec


Files in this item

FilesSizeFormatView

There are no files associated with this item.

This item appears in the following collection(s)

Show simple item record