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Application of electron channeling contrast imaging to 3D semiconductor structures through proper detector configurations

dc.contributor.authorHan, Han
dc.contributor.authorHantschel, Thomas
dc.contributor.authorStrakos, Libor
dc.contributor.authorVystavel, Tomas
dc.contributor.authorBaryshnikova, Marina
dc.contributor.authorMols, Yves
dc.contributor.authorKunert, Bernardette
dc.contributor.authorLanger, Robert
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorCaymax, Matty
dc.date.accessioned2021-10-28T22:21:25Z
dc.date.available2021-10-28T22:21:25Z
dc.date.issued2020
dc.identifier.issn0304-3991
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/35239
dc.sourceIIOimport
dc.titleApplication of electron channeling contrast imaging to 3D semiconductor structures through proper detector configurations
dc.typeJournal article
dc.contributor.imecauthorHan, Han
dc.contributor.imecauthorHantschel, Thomas
dc.contributor.imecauthorBaryshnikova, Marina
dc.contributor.imecauthorMols, Yves
dc.contributor.imecauthorKunert, Bernardette
dc.contributor.imecauthorLanger, Robert
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorCaymax, Matty
dc.contributor.orcidimecHan, Han::0000-0003-2169-8332
dc.contributor.orcidimecHantschel, Thomas::0000-0001-9476-4084
dc.contributor.orcidimecBaryshnikova, Marina::0000-0002-5945-4459
dc.contributor.orcidimecKunert, Bernardette::0000-0002-8986-4109
dc.contributor.orcidimecLanger, Robert::0000-0002-1132-3468
dc.source.peerreviewyes
dc.source.beginpage112928
dc.source.journalUltramicroscopy
dc.source.volume210
dc.identifier.urlhttps://doi.org/10.1016/j.ultramic.2019.112928
imec.availabilityPublished - imec


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