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Role of LV-SEM reticle CD measurements on DUV lithography

dc.contributor.authorMarschner, Thomas
dc.contributor.authorPollentier, Ivan
dc.contributor.authorPotoms, Goedele
dc.contributor.authorJonckheere, Rik
dc.contributor.authorRonse, Kurt
dc.contributor.authorPolli, M.
dc.date.accessioned2021-10-14T11:30:01Z
dc.date.available2021-10-14T11:30:01Z
dc.date.issued1999
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/3650
dc.sourceIIOimport
dc.titleRole of LV-SEM reticle CD measurements on DUV lithography
dc.typeProceedings paper
dc.contributor.imecauthorPollentier, Ivan
dc.contributor.imecauthorPotoms, Goedele
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.imecauthorRonse, Kurt
dc.contributor.orcidimecPollentier, Ivan::0000-0002-4266-6500
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage830
dc.source.endpage837
dc.source.conferenceMetrology, Inspection, and Process Control for Microlithography XIII
dc.source.conferencedate15/03/1999
dc.source.conferencelocationSanta Clara, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol.3677


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