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Alkaline cleaning of silicon wafers: additives for the prevention of metal contamination

dc.contributor.authorMartin Hoyas, Ana
dc.contributor.authorBaeyens, Martien
dc.contributor.authorHub, W.
dc.contributor.authorMertens, Paul
dc.contributor.authorKolbesen, B. O.
dc.date.accessioned2021-10-14T11:30:10Z
dc.date.available2021-10-14T11:30:10Z
dc.date.issued1999
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/3655
dc.sourceIIOimport
dc.titleAlkaline cleaning of silicon wafers: additives for the prevention of metal contamination
dc.typeJournal article
dc.contributor.imecauthorMertens, Paul
dc.source.peerreviewno
dc.source.beginpage197
dc.source.endpage208
dc.source.journalMicroelectronic Engineering
dc.source.issue2_3
dc.source.volume45
imec.availabilityPublished - imec


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