dc.contributor.author | Proost, Joris | |
dc.contributor.author | Li, H. | |
dc.contributor.author | Conard, Thierry | |
dc.contributor.author | Boullart, Werner | |
dc.contributor.author | Maex, Karen | |
dc.date.accessioned | 2021-10-14T11:34:55Z | |
dc.date.available | 2021-10-14T11:34:55Z | |
dc.date.issued | 1999 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/3766 | |
dc.source | IIOimport | |
dc.title | Chemical and electrical characterization of the interaction of BCl 3/Cl2 etching and CF4/H2O stripping plasmas with aluminum surfaces | |
dc.type | Journal article | |
dc.contributor.imecauthor | Conard, Thierry | |
dc.contributor.imecauthor | Boullart, Werner | |
dc.contributor.imecauthor | Maex, Karen | |
dc.contributor.orcidimec | Conard, Thierry::0000-0002-4298-5851 | |
dc.contributor.orcidimec | Boullart, Werner::0000-0001-7614-2097 | |
dc.source.peerreview | no | |
dc.source.beginpage | 4230 | |
dc.source.endpage | 4235 | |
dc.source.journal | J. Electrochem. Soc. | |
dc.source.issue | 11 | |
imec.availability | Published - imec | |