Lithography simulation with aerial image - variable threshold resist model
| dc.contributor.author | Randall, John | |
| dc.contributor.author | Gangala, Hareen K | |
| dc.contributor.author | Tritchkov, Alexander | |
| dc.date.accessioned | 2021-10-14T11:35:07Z | |
| dc.date.available | 2021-10-14T11:35:07Z | |
| dc.date.issued | 1999 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/3769 | |
| dc.source | IIOimport | |
| dc.title | Lithography simulation with aerial image - variable threshold resist model | |
| dc.type | Journal article | |
| dc.date.embargo | 9999-12-31 | |
| dc.source.peerreview | no | |
| dc.source.beginpage | 59 | |
| dc.source.endpage | 63 | |
| dc.source.journal | Microelectronic Engineering | |
| dc.source.issue | 1_4 | |
| dc.source.volume | 46 | |
| imec.availability | Published - open access | |
| imec.internalnotes | MNE 98 - International Conf. on Micro- and Nanofabrication; 22-24 September 1998; Leuven, Belgium |