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Resolution enhancement techniques in optical lithography

dc.contributor.authorRonse, Kurt
dc.contributor.authorVan den hove, Luc
dc.date.accessioned2021-10-14T11:35:48Z
dc.date.available2021-10-14T11:35:48Z
dc.date.issued1999
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/3780
dc.sourceIIOimport
dc.titleResolution enhancement techniques in optical lithography
dc.typeJournal article
dc.contributor.imecauthorRonse, Kurt
dc.contributor.imecauthorVan den hove, Luc
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage241
dc.source.journalSemiconductor Fabtech
dc.source.volume10
imec.availabilityPublished - open access


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