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dc.contributor.authorJung, Taehwan
dc.contributor.authorO'Sullivan, Barry
dc.contributor.authorRonchi, Nicolo
dc.contributor.authorLinten, Dimitri
dc.contributor.authorShin, Changhwan
dc.contributor.authorVan Houdt, Jan
dc.date.accessioned2022-01-12T10:41:59Z
dc.date.available2021-11-02T16:01:02Z
dc.date.available2022-01-12T10:41:59Z
dc.date.issued2020
dc.identifier.issn1930-8841
dc.identifier.otherWOS:000659349800014
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/37867.2
dc.sourceWOS
dc.titleImpact of interface layer on charge trapping in Si:HfO2 based FeF FT
dc.typeProceedings paper
dc.contributor.imecauthorJung, Taehwan
dc.contributor.imecauthorO'Sullivan, Barry
dc.contributor.imecauthorRonchi, Nicolo
dc.contributor.imecauthorLinten, Dimitri
dc.contributor.imecauthorVan Houdt, Jan
dc.contributor.orcidimecO'Sullivan, Barry::0000-0002-9036-8241
dc.contributor.orcidimecRonchi, Nicolo::0000-0002-7961-4077
dc.contributor.orcidimecLinten, Dimitri::0000-0001-8434-1838
dc.contributor.orcidimecVan Houdt, Jan::0000-0003-1381-6925
dc.contributor.orcidimecVan Houdt, Jan::1234-1234-1234-1235
dc.identifier.doi10.1109/IIRW49815.2020.9312866
dc.identifier.eisbn978-1-7281-7058-9
dc.source.numberofpages6
dc.source.peerreviewyes
dc.source.beginpage68
dc.source.endpage73
dc.source.conferenceIEEE International Integrated Reliability Workshop (IIRW)
dc.source.conferencedateOCT 04-NOV 01, 2020
dc.source.conferencelocationVirtual
dc.source.journalna
imec.availabilityUnder review


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