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Impact of interface layer on charge trapping in Si:HfO2 based FeF FT
dc.contributor.author | Jung, Taehwan | |
dc.contributor.author | O'Sullivan, Barry | |
dc.contributor.author | Ronchi, Nicolo | |
dc.contributor.author | Linten, Dimitri | |
dc.contributor.author | Shin, Changhwan | |
dc.contributor.author | Van Houdt, Jan | |
dc.date.accessioned | 2021-11-02T16:01:02Z | |
dc.date.available | 2021-11-02T16:01:02Z | |
dc.date.issued | 2020 | |
dc.identifier.issn | 1930-8841 | |
dc.identifier.other | WOS:000659349800014 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/37867 | |
dc.source | WOS | |
dc.title | Impact of interface layer on charge trapping in Si:HfO2 based FeF FT | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Jung, Taehwan | |
dc.contributor.imecauthor | O'Sullivan, Barry | |
dc.contributor.imecauthor | Ronchi, Nicolo | |
dc.contributor.imecauthor | Linten, Dimitri | |
dc.contributor.imecauthor | Van Houdt, Jan | |
dc.contributor.orcidimec | O'Sullivan, Barry::0000-0002-9036-8241 | |
dc.contributor.orcidimec | Ronchi, Nicolo::0000-0002-7961-4077 | |
dc.contributor.orcidimec | Linten, Dimitri::0000-0001-8434-1838 | |
dc.contributor.orcidimec | Van Houdt, Jan::0000-0003-1381-6925 | |
dc.identifier.doi | 10.1109/IIRW49815.2020.9312866 | |
dc.identifier.eisbn | 978-1-7281-7058-9 | |
dc.source.numberofpages | 6 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 68 | |
dc.source.endpage | 73 | |
dc.source.conference | IEEE International Integrated Reliability Workshop (IIRW) | |
dc.source.conferencedate | OCT 04-NOV 01, 2020 | |
imec.availability | Under review |
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