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Accurate mapping of dose variations on EUV scanners using dose-to-clear exposures and optical ellipsometry

dc.contributor.authorNair, Vineet Vijayakrishnan
dc.contributor.authorVan Look, Lieve
dc.contributor.authorAubert, Remko
dc.contributor.authorHendrickx, Eric
dc.date.accessioned2022-01-05T11:29:23Z
dc.date.available2021-11-02T16:03:40Z
dc.date.available2022-01-05T11:29:23Z
dc.date.issued2020
dc.identifier.issn0277-786X
dc.identifier.otherWOS:000632585900007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/38076.2
dc.sourceWOS
dc.titleAccurate mapping of dose variations on EUV scanners using dose-to-clear exposures and optical ellipsometry
dc.typeProceedings paper
dc.contributor.imecauthorNair, Vineet Vijayakrishnan
dc.contributor.imecauthorVan Look, Lieve
dc.contributor.imecauthorAubert, Remko
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.orcidimecNair, Vineet Vijayakrishnan::0000-0002-8970-2425
dc.identifier.doi10.1117/12.2572993
dc.identifier.eisbn978-1-5106-3843-3
dc.source.numberofpages11
dc.source.peerreviewyes
dc.source.conferenceConference on Extreme Ultraviolet Lithography
dc.source.conferencedateSEP 21-25, 2020
dc.source.conferencelocationMonterey, CA, USA
dc.source.journalProceedings of SPIE
dc.source.volume11517
imec.availabilityPublished - imec


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220.500.12860/38076.2*2022-01-05T11:28:03Zvalidation by library/open access desk
120.500.12860/380762021-11-02T16:03:40Z

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