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Mask Contribution to OPC Model Accuracy

dc.contributor.authorLyons, Adam
dc.contributor.authorWallow, Tom
dc.contributor.authorHennerkes, Christoph
dc.contributor.authorSpence, Chris
dc.contributor.authorDelorme, Max
dc.contributor.authorRio, David
dc.contributor.authorTsunoda, Dai
dc.contributor.authorTorigoe, Yohei
dc.contributor.authorHamaji, Masakazu
dc.date.accessioned2021-12-10T11:02:18Z
dc.date.available2021-11-02T16:03:47Z
dc.date.available2021-12-10T11:02:18Z
dc.date.issued2020
dc.identifier.issn0277-786X
dc.identifier.otherWOS:000632585900017
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/38086.2
dc.sourceWOS
dc.titleMask Contribution to OPC Model Accuracy
dc.typeProceedings paper
dc.contributor.imecauthorDelorme, Max
dc.contributor.imecauthorRio, David
dc.identifier.doi10.1117/12.2573160
dc.identifier.eisbn978-1-5106-3843-3
dc.source.numberofpages11
dc.source.peerreviewyes
dc.source.beginpage115171D
dc.source.conferenceConference on Extreme Ultraviolet Lithography
dc.source.conferencedateSEP 21-25, 2020
dc.source.conferencelocationVirtual
dc.source.journalProceedings of SPIE
dc.source.volume11517
imec.availabilityPublished - imec


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220.500.12860/38086.2*2021-12-10T10:58:46Zvalidation by library/open access desk
120.500.12860/380862021-11-02T16:03:47Z

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