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A novel self-aligned double patterning integrated with Ga+ focused ion beam milling for silicon nanowire definition
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Authors
Rosa, Andressa Macedo
;
Leonhardt, Alessandra
;
de Souza, Lais Oliveira
;
Barbosa Lima, Lucas Petersen
;
Puydinger dos Santos, Marcos Vinicius
;
Manera, Leandro Tiago
;
Diniz, Jose Alexandre
DOI
10.1016/j.mee.2020.111493
ISSN
0167-9317
Issue
na
Journal
MICROELECTRONIC ENGINEERING
Volume
237
Title
A novel self-aligned double patterning integrated with Ga+ focused ion beam milling for silicon nanowire definition
Publication type
Journal article
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2
20.500.12860/38261.2
*
2022-01-28T09:21:52Z
validation by library/open access desk
1
20.500.12860/38261
2021-11-02T16:06:16Z
*Selected version
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