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Perspectives and tradeoffs of absorber materials for high NA EUV lithography
dc.contributor.author | Erdmann, Andreas | |
dc.contributor.author | Mesilhy, Hazem | |
dc.contributor.author | Evanschitzky, Peter | |
dc.contributor.author | Philipsen, Vicky | |
dc.contributor.author | Timmermans, Frank | |
dc.contributor.author | Bauer, Markus | |
dc.date.accessioned | 2021-11-02T16:06:41Z | |
dc.date.available | 2021-11-02T16:06:41Z | |
dc.date.issued | 2020-OCT | |
dc.identifier.issn | 1932-5150 | |
dc.identifier.other | WOS:000604919000003 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/38293 | |
dc.source | WOS | |
dc.title | Perspectives and tradeoffs of absorber materials for high NA EUV lithography | |
dc.type | Journal article | |
dc.contributor.imecauthor | Philipsen, Vicky | |
dc.contributor.orcidimec | Philipsen, Vicky::0000-0002-2959-432X | |
dc.identifier.doi | 10.1117/1.JMM.19.4.041001 | |
dc.source.numberofpages | 16 | |
dc.source.peerreview | yes | |
dc.source.journal | JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS | |
dc.source.issue | 4 | |
dc.source.volume | 19 | |
imec.availability | Under review |
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