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Influence of process-induced stress on device characteristics and its impact on scaled device performance

dc.contributor.authorSmeys, Peter
dc.contributor.authorGriffin, P. B.
dc.contributor.authorRek, Z. U.
dc.contributor.authorDe Wolf, Ingrid
dc.contributor.authorSaraswat, K. C.
dc.date.accessioned2021-10-14T11:39:36Z
dc.date.available2021-10-14T11:39:36Z
dc.date.issued1999
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/3834
dc.sourceIIOimport
dc.titleInfluence of process-induced stress on device characteristics and its impact on scaled device performance
dc.typeJournal article
dc.contributor.imecauthorDe Wolf, Ingrid
dc.contributor.orcidimecDe Wolf, Ingrid::0000-0003-3822-5953
dc.source.peerreviewno
dc.source.beginpage1245
dc.source.endpage1252
dc.source.journalIEEE Trans. Electron Devices
dc.source.issue6
dc.source.volume46
imec.availabilityPublished - imec


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