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dc.contributor.authorYou, Shuzhen
dc.contributor.authorGeens, Karen
dc.contributor.authorBorga, Matteo
dc.contributor.authorLiang, Hu
dc.contributor.authorHahn, Herwig
dc.contributor.authorFahle, Dirk
dc.contributor.authorHeuken, Michael
dc.contributor.authorMukherjee, Kalparupa
dc.contributor.authorDe Santi, Carlo
dc.contributor.authorMeneghini, Matteo
dc.contributor.authorZanoni, Enrico
dc.contributor.authorBerg, Martin
dc.contributor.authorRamvall, Peter
dc.contributor.authorKumar, Ashutosh
dc.contributor.authorBjork, Mikael T.
dc.contributor.authorOhlsson, B. Jonas
dc.contributor.authorDecoutere, Stefaan
dc.date.accessioned2022-01-08T02:05:06Z
dc.date.available2022-01-08T02:05:06Z
dc.date.issued2021-NOV
dc.identifier.issn0026-2714
dc.identifier.otherWOS:000733586300008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/38725
dc.sourceWOS
dc.titleVertical GaN devices: Process and reliability
dc.typeJournal article
dc.contributor.imecauthorYou, Shuzhen
dc.contributor.imecauthorGeens, Karen
dc.contributor.imecauthorBorga, Matteo
dc.contributor.imecauthorLiang, Hu
dc.contributor.imecauthorDecoutere, Stefaan
dc.contributor.orcidimecGeens, Karen::0000-0003-1815-3972
dc.contributor.orcidimecBorga, Matteo::0000-0003-3087-6612
dc.contributor.orcidimecDecoutere, Stefaan::0000-0001-6632-6239
dc.identifier.doi10.1016/j.microrel.2021.114218
dc.source.numberofpages6
dc.source.peerreviewyes
dc.source.journalMICROELECTRONICS RELIABILITY
dc.source.volume126
imec.availabilityUnder review


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