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A synchrotron radiation photoelectron spectroscopy study on atomic-scale wet etching of InAs (111)-A and (111)-B in acidic peroxide solutions: surface chemistry versus kinetics

dc.contributor.authorAbrenica, Graniel
dc.contributor.authorLebedev, M. V.
dc.contributor.authorFingerle, M.
dc.contributor.authorArnauts, Sophia
dc.contributor.authorCalvet, W.
dc.contributor.authorMayer, T.
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorvan Dorp, Dennis
dc.date.accessioned2022-01-19T10:01:53Z
dc.date.available2022-01-15T02:07:31Z
dc.date.available2022-01-19T10:01:53Z
dc.date.issued2022
dc.identifier.issn2468-5194
dc.identifier.otherWOS:000740338100001
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/38745.2
dc.sourceWOS
dc.titleA synchrotron radiation photoelectron spectroscopy study on atomic-scale wet etching of InAs (111)-A and (111)-B in acidic peroxide solutions: surface chemistry versus kinetics
dc.typeJournal article
dc.contributor.imecauthorAbrenica, Graniel
dc.contributor.imecauthorArnauts, Sophia
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorvan Dorp, Dennis
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.contributor.orcidimecvan Dorp, Dennis::0000-0002-1085-4232
dc.contributor.orcidimecAbrenica, Graniel::0000-0003-0257-2603
dc.contributor.orcidimecArnauts, Sophia::0009-0006-5211-6402
dc.identifier.doi10.1016/j.mtchem.2021.100728
dc.source.numberofpages7
dc.source.peerreviewyes
dc.source.beginpage100728
dc.source.journalMATERIALS TODAY CHEMISTRY
dc.source.issuena
dc.source.volume23
imec.availabilityPublished - imec
dc.description.wosFundingTextThe authors acknowledge the imec Industrial Affiliation Program on III-V/Ge devices. The authors thank Helmholtz-Zentrum Berlin (HZB) for the allocation of synchrotron radiation beamtime. This research has been supported also by the project CALIPSOplus under the Grant Agreement 730872 from the EU Framework Program for Research and Innovation HORIZON 2020. The authors also would like to thank Frank Holsteyns for management support. MVL acknowledges the support of the Russian Foundation for Basic Research (project 20-03-00523).


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220.500.12860/38745.2*2022-01-19T09:58:13Zvalidation by library/open access desk
120.500.12860/387452022-01-15T02:07:31Z

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