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Oxide and Interface Degradation Resulting from Substrate Hot-Hole Injection at 295K and 77K

dc.contributor.authorVan den bosch, G.
dc.contributor.authorGroeseneken, Guido
dc.contributor.authorMaes, Herman
dc.contributor.authorKlein, R.
dc.contributor.authorSaks, N. S.
dc.date.accessioned2021-09-29T12:49:20Z
dc.date.available2021-09-29T12:49:20Z
dc.date.issued1994
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/387
dc.sourceIIOimport
dc.titleOxide and Interface Degradation Resulting from Substrate Hot-Hole Injection at 295K and 77K
dc.typeJournal article
dc.contributor.imecauthorGroeseneken, Guido
dc.source.peerreviewno
dc.source.beginpage2073
dc.source.endpage2080
dc.source.journalJ. Appl. Phys.
dc.source.volume75
imec.availabilityPublished - imec


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