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dc.contributor.authorLiu, Yefan
dc.contributor.authorClima, Sergiu
dc.contributor.authorHiblot, Gaspard
dc.contributor.authorMatagne, Philippe
dc.contributor.authorPopovici, Mihaela Ioana
dc.contributor.authorKaczer, Ben
dc.contributor.authorVelenis, Dimitrios
dc.contributor.authorDe Wolf, Ingrid
dc.date.accessioned2022-02-24T10:31:05Z
dc.date.available2022-02-24T10:31:05Z
dc.date.issued2021
dc.identifier.issn0741-3106
dc.identifier.otherWOS:000613404400033
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/39100
dc.sourceWOS
dc.titleInvestigation of the Impact of Externally Applied Out-of-Plane Stress on Ferroelectric FET
dc.typeJournal article
dc.contributor.imecauthorLiu, Yefan
dc.contributor.imecauthorClima, Sergiu
dc.contributor.imecauthorHiblot, Gaspard
dc.contributor.imecauthorMatagne, Philippe
dc.contributor.imecauthorPopovici, Mihaela Ioana
dc.contributor.imecauthorKaczer, Ben
dc.contributor.imecauthorVelenis, Dimitrios
dc.contributor.imecauthorDe Wolf, Ingrid
dc.contributor.orcidimecLiu, Yefan::0000-0002-0783-6148
dc.contributor.orcidimecClima, Sergiu::0000-0002-4044-9975
dc.contributor.orcidimecKaczer, Ben::0000-0002-1484-4007
dc.contributor.orcidimecHiblot, Gaspard::0000-0002-3869-965X
dc.contributor.orcidimecDe Wolf, Ingrid::0000-0003-3822-5953
dc.identifier.doi10.1109/LED.2020.3049093
dc.source.numberofpages4
dc.source.peerreviewyes
dc.source.beginpage264
dc.source.endpage267
dc.source.journalIEEE ELECTRON DEVICE LETTERS
dc.source.issue2
dc.source.volume42
imec.availabilityPublished - imec


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