dc.contributor.author | Moussa, Alain | |
dc.contributor.author | Severi, Simone | |
dc.contributor.author | Lorusso, Gian | |
dc.contributor.author | De Simone, Danilo | |
dc.contributor.author | Charley, Anne-Laure | |
dc.date.accessioned | 2022-05-25T08:56:09Z | |
dc.date.available | 2022-05-22T02:19:04Z | |
dc.date.available | 2022-05-25T08:56:09Z | |
dc.date.issued | 2021 | |
dc.identifier.isbn | 978-1-5106-4552-3 | |
dc.identifier.issn | 0277-786X | |
dc.identifier.other | WOS:000792657300016 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/39863.2 | |
dc.source | WOS | |
dc.title | High NA EUV: a challenge for metrology, an opportunity for atomic force microscopy | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Moussa, Alain | |
dc.contributor.imecauthor | Severi, Simone | |
dc.contributor.imecauthor | Lorusso, Gian | |
dc.contributor.imecauthor | De Simone, Danilo | |
dc.contributor.imecauthor | Charley, Anne-Laure | |
dc.contributor.orcidimec | De Simone, Danilo::0000-0003-3927-5207 | |
dc.contributor.orcidimec | Charley, Anne-Laure::0000-0003-4745-0167 | |
dc.identifier.doi | 10.1117/12.2601677 | |
dc.identifier.eisbn | 978-1-5106-4553-0 | |
dc.source.numberofpages | 6 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 1185410 | |
dc.source.conference | International Conference on Extreme Ultraviolet Lithography | |
dc.source.conferencedate | SEP 27-OCT 01, 2021 | |
dc.source.conferencelocation | Virtual | |
dc.source.journal | Proceedings of SPIE | |
dc.source.volume | 11854 | |
imec.availability | Published - imec | |