Simulation of polychromatic effects in high NA EUV lithography
dc.contributor.author | Erdmann, Andreas | |
dc.contributor.author | Mesilhy, Hazem | |
dc.contributor.author | Evanschitzky, Peter | |
dc.contributor.author | Saadeh, Qais | |
dc.contributor.author | Soltwisch, Victor | |
dc.contributor.author | Bihr, Simon | |
dc.contributor.author | Zimmermann, Joerg | |
dc.contributor.author | Philipsen, Vicky | |
dc.date.accessioned | 2022-06-28T13:36:33Z | |
dc.date.available | 2022-05-22T02:19:15Z | |
dc.date.available | 2022-05-23T10:55:10Z | |
dc.date.available | 2022-06-28T13:36:33Z | |
dc.date.issued | 2021 | |
dc.identifier.isbn | 978-1-5106-4552-3 | |
dc.identifier.issn | 0277-786X | |
dc.identifier.other | WOS:000792657300001 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/39877.3 | |
dc.source | WOS | |
dc.title | Simulation of polychromatic effects in high NA EUV lithography | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Philipsen, Vicky | |
dc.contributor.orcidimec | Philipsen, Vicky::0000-0002-2959-432X | |
dc.identifier.doi | 10.1117/12.2600931 | |
dc.identifier.eisbn | 978-1-5106-4553-0 | |
dc.source.numberofpages | 13 | |
dc.source.peerreview | yes | |
dc.subject.discipline | Applied physics | |
dc.source.conference | International Conference on Extreme Ultraviolet Lithography | |
dc.source.conferencedate | SEP 27-OCT 01, 2021 | |
dc.source.conferencelocation | online | |
dc.source.journal | Proceedings of SPIE | |
dc.source.volume | 11854 | |
imec.availability | Published - imec |
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