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Plasma enhanced atomic layer etching of high-k layers on WS2
dc.contributor.author | de Marneffe, J. -F. | |
dc.contributor.author | Marinov, D. | |
dc.contributor.author | Goodyear, A. | |
dc.contributor.author | Wyndaele, P. -j. | |
dc.contributor.author | St. J. Braithwaite, N. | |
dc.contributor.author | Kundu, S. | |
dc.contributor.author | Asselberghs, I. | |
dc.contributor.author | Cooke, M. | |
dc.contributor.author | De Gendt, S. | |
dc.date.accessioned | 2022-06-15T02:21:33Z | |
dc.date.available | 2022-06-15T02:21:33Z | |
dc.date.issued | 2022-JUL | |
dc.identifier.issn | 0734-2101 | |
dc.identifier.other | WOS:000804453900001 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/39951 | |
dc.source | WOS | |
dc.title | Plasma enhanced atomic layer etching of high-k layers on WS2 | |
dc.type | Journal article | |
dc.contributor.imecauthor | de Marneffe, J. -F. | |
dc.contributor.imecauthor | Marinov, D. | |
dc.contributor.imecauthor | Wyndaele, P. -j. | |
dc.contributor.imecauthor | Kundu, S. | |
dc.contributor.imecauthor | Asselberghs, I. | |
dc.contributor.imecauthor | De Gendt, S. | |
dc.identifier.doi | 10.1116/6.0001726 | |
dc.source.numberofpages | 9 | |
dc.source.peerreview | yes | |
dc.source.journal | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | |
dc.source.issue | 4 | |
dc.source.volume | 40 | |
imec.availability | Under review |
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