Publication:

Plasma enhanced atomic layer etching of high-k layers on WS2

Date

2022
Journal article
https://doi.org/10.1116/6.0001726
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Author(s)

de Marneffe, Jean-Francois  
;
Marinov, D.
;
Goodyear, A.
;
Wyndaele, Pieter-Jan  
;
St. J. Braithwaite, N.
;
Kundu, S.
;
Asselberghs, Inge  
;
Cooke, M.
;
De Gendt, Stefan  

Journal

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

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1280 since deposited on 2022-06-15
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1740 since deposited on 2022-06-15
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Acq. date: 2026-04-05

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