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Plasma enhanced atomic layer etching of high-k layers on WS2
Publication:
Plasma enhanced atomic layer etching of high-k layers on WS2
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Date
2022
Journal article
https://doi.org/10.1116/6.0001726
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2.91 MB
Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
de Marneffe, Jean-Francois
;
Marinov, D.
;
Goodyear, A.
;
Wyndaele, Pieter-Jan
;
St. J. Braithwaite, N.
;
Kundu, S.
;
Asselberghs, Inge
;
Cooke, M.
;
De Gendt, Stefan
Journal
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
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Downloads
1196
since deposited on 2022-06-15
192
last month
11
last week
Acq. date: 2025-12-11
Views
1730
since deposited on 2022-06-15
3
last month
1
last week
Acq. date: 2025-12-11
Citations