Publication:

Plasma enhanced atomic layer etching of high-k layers on WS2

Date

2022
Journal article
https://doi.org/10.1116/6.0001726
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dc.contributor.authorde Marneffe, Jean-Francois
dc.contributor.authorMarinov, D.
dc.contributor.authorGoodyear, A.
dc.contributor.authorWyndaele, Pieter-Jan
dc.contributor.authorSt. J. Braithwaite, N.
dc.contributor.authorKundu, S.
dc.contributor.authorAsselberghs, Inge
dc.contributor.authorCooke, M.
dc.contributor.authorDe Gendt, Stefan
dc.contributor.imecauthorde Marneffe, Jean-Francois
dc.contributor.imecauthorWyndaele, Pieter-Jan
dc.contributor.imecauthorKundu, S.
dc.contributor.imecauthorAsselberghs, Inge
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecWyndaele, Pieter-Jan::0000-0003-4010-8377
dc.contributor.orcidimecKundu, Shreya::0000-0001-8052-7774
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.contributor.orcidimecde Marneffe, Jean-Francois::0000-0001-5178-6670
dc.contributor.orcidimecAsselberghs, Inge::0000-0001-8371-3222
dc.date.accessioned2022-09-01T13:44:22Z
dc.date.available2022-06-15T02:21:33Z
dc.date.available2022-09-01T13:44:22Z
dc.date.embargo2023-05-26
dc.date.issued2022
dc.description.wosFundingTextD. Marinov has received funding from the European Unions Horizon 2020 research and innovation program under Marie Sklodowska-Curie, Grant Agreement No. 752164. J.-F. de Marneffe received funding from the Graphene Flagship, Grant Agreement No. 952792. All authors acknowledge the support of imecs beyond CMOS program, imecs pilot line, and imecs materials and characterization (MCA) group. The authors thank Dr. Laura Nyns (imec) for the ALD of ZrO 2 and HfO 2 films and Dr. Benjamin Groven (imec) for the deposition of WS 2 films by PEALD.
dc.identifier.doi10.1116/6.0001726
dc.identifier.issn0734-2101
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/39951
dc.publisherA V S AMER INST PHYSICS
dc.source.beginpage042602
dc.source.issue4
dc.source.journalJOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
dc.source.numberofpages9
dc.source.volume40
dc.subject.keywordsMOS2
dc.subject.keywordsDEPOSITION
dc.subject.keywordsHFO2
dc.title

Plasma enhanced atomic layer etching of high-k layers on WS2

dc.typeJournal article
dspace.entity.typePublication
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