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    • Status 157nm lithography development at IMEC 

      Ronse, Kurt; De Bisschop, Peter; Eliat, Astrid; Goethals, Mieke; Hermans, Jan; Jonckheere, Rik; Van Den Heuvel, Dieter; Van Roey, Frieda; Beckx, Stephan; Wouters, Jan; de Marneffe, Jean-Francois; O'Neil, Timothy; Tirri, Bruce; Sewell, Harry (2003)