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Low-temperature atomic and molecular hydrogen anneals for enhanced chemical SiO2 IL quality in low thermal budget RMG stacks

dc.contributor.authorFranco, Jacopo
dc.contributor.authorArimura, Hiroaki
dc.contributor.authorde Marneffe, Jean-Francois
dc.contributor.authorWu, Zhicheng
dc.contributor.authorVandooren, Anne
dc.contributor.authorRagnarsson, Lars-Ake
dc.contributor.authorDentoni Litta, Eugenio
dc.contributor.authorHoriguchi, Naoto
dc.contributor.authorCroes, Kristof
dc.contributor.authorLinten, Dimitri
dc.contributor.authorAfanasiev, Valeri
dc.contributor.authorGrasser, T.
dc.contributor.authorKaczer, Ben
dc.date.accessioned2022-08-25T15:55:52Z
dc.date.available2022-07-09T02:27:25Z
dc.date.available2022-08-25T15:55:52Z
dc.date.issued2021
dc.identifier.issn2380-9248
dc.identifier.otherWOS:000812325400158
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/40082.2
dc.sourceWOS
dc.titleLow-temperature atomic and molecular hydrogen anneals for enhanced chemical SiO2 IL quality in low thermal budget RMG stacks
dc.typeProceedings paper
dc.contributor.imecauthorFranco, Jacopo
dc.contributor.imecauthorArimura, Hiroaki
dc.contributor.imecauthorde Marneffe, Jean-Francois
dc.contributor.imecauthorWu, Zhicheng
dc.contributor.imecauthorVandooren, Anne
dc.contributor.imecauthorRagnarsson, Lars-Ake
dc.contributor.imecauthorDentoni Litta, Eugenio
dc.contributor.imecauthorHoriguchi, Naoto
dc.contributor.imecauthorCroes, Kristof
dc.contributor.imecauthorLinten, Dimitri
dc.contributor.imecauthorAfanasiev, Valeri
dc.contributor.imecauthorKaczer, Ben
dc.contributor.orcidimecFranco, Jacopo::0000-0002-7382-8605
dc.contributor.orcidimecVandooren, Anne::0000-0002-2412-0176
dc.contributor.orcidimecRagnarsson, Lars-Ake::0000-0003-1057-8140
dc.contributor.orcidimecDentoni Litta, Eugenio::0000-0003-0333-376X
dc.contributor.orcidimecHoriguchi, Naoto::0000-0001-5490-0416
dc.contributor.orcidimecCroes, Kristof::0000-0002-3955-0638
dc.contributor.orcidimecLinten, Dimitri::0000-0001-8434-1838
dc.contributor.orcidimecKaczer, Ben::0000-0002-1484-4007
dc.identifier.doi10.1109/IEDM19574.2021.9720657
dc.identifier.eisbn978-1-6654-2572-8
dc.source.numberofpages4
dc.source.peerreviewyes
dc.source.conferenceIEEE International Electron Devices Meeting (IEDM)
dc.source.conferencedateDEC 11-16, 2021
dc.source.conferencelocationSan Francisco
dc.source.journalna
imec.availabilityPublished - imec


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220.500.12860/40082.2*2022-08-25T15:52:09Zvalidation by library/open access desk
120.500.12860/400822022-07-09T02:27:25Z

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