Understanding the factors affecting contact resistance in nanowire field effect transistors (NWFETs) to improve nanoscale contacts for future scaling

Abstract

In this paper, dry etched vertical nanowires (VNWs) are used in transmission line/transfer length analysis to study the contacts of gate-all-around devices for future technology nodes. VNW resistors with Mo and Pd based metal stack contacts to p-InGaAs show Schottky behavior, unlike the planar counterpart. The resistance for Mo contact is higher than Pd, however, Pd was found to form an alloy with InGaAs at temperatures as low as 190 & DEG;C, and the length of Pd diffusion into the InGaAs increased at smaller NW dimensions, hindering future scalability. The minimum extracted specific contact resistivity (rho(C)) values are 1.6 x 10(-5) omega cm(2) (Mo) and 4.2 x 10(-6) omega cm(2) (Pd) for a doping level of 1 x 10(19) cm(-3). An apparent dependence of rho(C) on the NW diameter was also observed. This has been attributed to the surface states under the un-gated region of NW devices and found to dominate at smaller diameters. An analytical model to account for such geometrical effects has also been developed and validated with technology computer-aided design simulations. The analysis presented in this paper effectively captures the 3D aspects of an NW contact at nanoscale dimensions and can be applied irrespective of the semiconductor and contact metal used. Published under an exclusive license by AIP Publishing.